Postdoctoral Position in Atomic Layer Deposition for Next-Generation Lithography

Catholic University of Leuven

Embedded in the Leuven Chem&Tech and Leuven Nanocenter facilities, the Ameloot group (http://amelootgroup.org/) studies different flavors of materials and applications and has been awarded ERC Starting and Consolidator Grants. The group is one of the founding members of the Leuven Institute for Micro- and Nanoscale Integration (LIMNI, https://limni.kuleuven.be/). Our research is focused on enabling applications through a fundamental understanding of material formation processes and properties. KU Leuven (University of Leuven) has been a center of learning for nearly six centuries. Today, it is Belgium's largest and highest-ranked university and, founded in 1425, one of the oldest and most renowned universities in Europe. The university caters to over 60 000 students from more than 140 countries. KU Leuven's three doctoral schools provide internationally oriented PhD tracks for more than 4 000 doctoral students. KU Leuven and affiliated knowledge institutes provide fertile ground for innovation and high-tech entrepreneurship in the Leuven region. This favorable climate for knowledge-driven entrepreneurship and innovation makes the Leuven region an attractive location for many high-tech companies. More info: http://amelootgroup.org/positions/

Responsibilities

We are looking for a motivated postdoctoral research fellow to work on the vapor-phase deposition of novel resist materials for Extreme Ultraviolet (EUV) lithography, starting from the insights from our exploratory study using metal-organic frameworks (see https://www.nature.com/articles/s41563-020-00827-x). This novel type of lithography is deemed to be the future of the semiconductor industry but requires novel materials to reach optimal performance in nanometer-scale patterning. Conventional chemically amplified resists that worked well in the past do not provide high-resolution patterning through EUV lithography. This limitation is mainly due to their multi-component chemistry and acid diffusion mechanism.

In this postdoctoral project, you will focus on the development of vapor-phase deposition method for EUV resists and will be working together with scientists and engineers with complementary expertise in materials synthesis, film deposition, the characterization of novel resist materials, etc. This project will be carried out in collaboration with imec (https://www.imec-int.com/en), a leading micro- and nanoelectronics research center located next to the KU Leuven campus. For more information on the research group coordinating this project, please refer to http://amelootgroup.org/  and https://twitter.com/AmelootGroup.

The project will make use of a unique in-house developed reactor for atomic layer deposition (ALD). In addition to the work on EUV lithography, the project will involve the further development (and potential valorization) of this reactor. Depending on your interests, this aspect can become a larger part of your project. We did not publish information on this ALD reactor yet.

Profile

We are looking for:

  • A motivated candidate with a strong academic track record and a PhD in Materials Chemistry or a related field in Science and Engineering.
  • A candidate passionate about novel materials, chemistry, and technology, and willing to work as part of an interdisciplinary team.
  • An experienced researcher willing to guide younger colleagues starting out in the field.
  • ¬†Previous demonstrations of out-of-the-box thinking. Bonus points if you consider yourself a 'maker' and practical problem solver, we appreciate what you are doing!
  • Since we target real-world applications through our research, an interest in valorization (e.g., spin-off creation) is a plus.
  • Since we are a highly international team, proficiency in both written and spoken English is non-negotiable.

Please consider applying if you have several of the following skills:

  • Required: Expertise in the development of processes for atomic layer deposition / molecular layer deposition & thin film characterization.
  • Experience with/an interest in the development of tools for thin film deposition is a plus
  • Experience with/an interest in the development of novel resist materials for lithography is a plus
  • Other skills that you think are relevant (please explain in your cover letter).

Offer

A1 year postdoctoral position with possible extension for 1 or 2 more years.

Interested?

Please submit your application through the KU Leuven portal. In case you have questions about this job opportunity, please contact Prof. Rob Ameloot (Rob.Ameloot@kuleuven.be) via email and mention "Postdoc position ALD & EUV" in the subject line.

Preferred starting date: as soon as your schedule permits

You can apply for this job no later than June 02, 2023 via the
KU Leuven seeks to foster an environment where all talents can flourish, regardless of gender, age, cultural background, nationality or impairments. If you have any questions relating to accessibility or support, please contact us at diversiteit.HR@kuleuven.be.
  • Employment percentage: Voltijds
  • Location: Leuven
  • Apply before: June 2, 2023
  • Tags: Materiaalkunde
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